Growth characteristics and electrical properties of Ta2O5 grown by thermal and O3-based atomic layer deposition on TiN substrates for metal–insulator–metal capacitor applications

✍ Scribed by Kim, Min-Kyu; Kim, Woo-Hee; Lee, Taeyoon; Kim, Hyungjun

• Book ID: 122937028
• Publisher: Elsevier Science
• Year: 2013
• Tongue: English
• Weight: 560 KB
• Volume: 542
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2013.06.050