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Electrical characterization of thin Al2O3 films grown by atomic layer deposition on silicon and various metal substrates

✍ Scribed by M.D. Groner; J.W. Elam; F.H. Fabreguette; S.M. George

Book ID
108388435
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
382 KB
Volume
413
Category
Article
ISSN
0040-6090

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✍ Per Ericsson; Stefan Bengtsson; Jarmo Skarp πŸ“‚ Article πŸ“… 1997 πŸ› Elsevier Science 🌐 English βš– 293 KB

A1203-films deposited by atomic layer epitaxy onto silicon wafers were investigated structurally and electrically. A post-deposition anneal at 900Β°C resulted in a decrease in film thickness of about 10% and an increase in the index of refraction of about 3%. The densification did not significantly i