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Structural properties of Al2O3 dielectrics grown on TiN metal substrates by atomic layer deposition

✍ Scribed by Chun-I. Hsieh; Tung-Ming Pan; Jian-Chyi Lin; Yan-Bo Peng; Tsai-Yu Huang; Chang-Rong Wu; Steven Shih

Book ID: 108063791
Publisher: Elsevier Science
Year: 2009
Tongue: English
Weight: 925 KB
Volume: 255
Category: Article
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2008.10.048

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