Origin of etch delay time in Cl2 dry etching of AlGaN/GaN structures

✍ Scribed by Buttari, D.; Chini, A.; Palacios, T.; Coffie, R.; Shen, L.; Xing, H.; Heikman, S.; McCarthy, L.; Chakraborty, A.; Keller, S.; Mishra, U. K.

• Book ID: 115460372
• Publisher: American Institute of Physics
• Year: 2003
• Tongue: English
• Weight: 301 KB
• Volume: 83
• Category: Article
• ISSN: 0003-6951
• DOI: 10.1063/1.1632035