Systematic characterization of Cl2 reactive ion etching for improved ohmics in AlGaN/GaN HEMTs

✍ Scribed by Buttari, D.; Chini, A.; Meneghesso, G.; Zanoni, E.; Moran, B.; Heikman, S.; Zhang, N.Q.; Shen, L.; Coffie, R.; DenBaars, S.P.; Mishra, U.K.

• Book ID: 121234882
• Publisher: IEEE
• Year: 2002
• Tongue: English
• Weight: 64 KB
• Volume: 23
• Category: Article
• ISSN: 0741-3106
• DOI: 10.1109/55.981311