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Dry etching of TiN in N2/Cl2/Ar adaptively coupled plasma

✍ Scribed by Dong-Pyo Kim; Jong-Chang Woo; Kyu-Ha Baek; Kun-Sik Park; Kijun Lee; Kwang-Soo Kim; Lee-Mi Do

Book ID: 113940898
Publisher: Elsevier Science
Year: 2011
Tongue: English
Weight: 995 KB
Volume: 86
Category: Article
ISSN: 0042-207X
DOI: 10.1016/j.vacuum.2011.08.002

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