✦ LIBER ✦

Dry via hole etching of GaAs using high-density Cl[sub 2]/Ar plasma

✍ Scribed by Chen, Y. W.; Ooi, B. S.; Ng, G. I.; Radhakrishnan, K.; Tan, C. L.

Book ID: 121308011
Publisher: AVS (American Vacuum Society)
Year: 2000
Tongue: English
Weight: 610 KB
Volume: 18
Category: Article
ISSN: 0734-211X
DOI: 10.1116/1.1289548

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Deep dry etching of GaAs and GaSb using

Deep dry etching of GaAs and GaSb using Cl[sub 2]/Ar plasma discharges

✍ Giehl, Alexander R.; Gumbel, Michael; Kessler, Matthias; Herhammer, Norbert; Hof 📂 Article 📅 2003 🏛 AVS (American Vacuum Society) 🌐 English ⚖ 445 KB

Actinometry of inductively coupled Cl[su

Actinometry of inductively coupled Cl[sub 2]âN[sub 2] plasmas for dry etching of GaAs

✍ BruÌckl, Tobias; Zull, Heribert 📂 Article 📅 2005 🏛 American Institute of Physics 🌐 English ⚖ 401 KB

Dry etching of germanium using inductive

Dry etching of germanium using inductively coupled Ar/CCl2F2/Cl2plasma

✍ Taek Sung Kim; Sang-Sik Choi; Mi Im Shin; Tae Soo Jeong; Sukil Kang; Chel-Jong C 📂 Article 📅 2010 🏛 The Korean Institute of Metals and Materials 🌐 English ⚖ 611 KB

Optimization of GaAs ECR etching in chem

Optimization of GaAs ECR etching in chemically assisted ion beam process using Cl2/Ar plasma

✍ S.F Yoon; T.K Ng; H.Q Zheng 📂 Article 📅 2000 🏛 Elsevier Science 🌐 English ⚖ 628 KB

High-density plasma etching of indium–zi

High-density plasma etching of indium–zinc oxide films in Ar/Cl2 and Ar/CH4/H2 chemistries

✍ W.T. Lim; L. Stafford; Ju-Il Song; Jae-Soung Park; Y.W. Heo; Joon-Hyung Lee; Jeo 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 685 KB

Low-Dimensional Waveguide Grating Fabric

Low-Dimensional Waveguide Grating Fabrication in GaN with Use of SiCl4/Cl2/Ar-Based Inductively Coupled Plasma Dry Etching

✍ R. Dylewicz; S. Patela; R. A. Hogg; P. W. Fry; P. J. Parbrook; R. Airey; A. Tahr 📂 Article 📅 2009 🏛 Springer US 🌐 English ⚖ 332 KB