High-density plasma etching of indium–zinc oxide films in Ar/Cl2 and Ar/CH4/H2 chemistries

✍ Scribed by W.T. Lim; L. Stafford; Ju-Il Song; Jae-Soung Park; Y.W. Heo; Joon-Hyung Lee; Jeong-Joo Kim; S.J. Pearton

• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 685 KB
• Volume: 253
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2006.05.052