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Optimization of GaAs ECR etching in chemically assisted ion beam process using Cl2/Ar plasma

✍ Scribed by S.F Yoon; T.K Ng; H.Q Zheng

Publisher: Elsevier Science
Year: 2000
Tongue: English
Weight: 628 KB
Volume: 3
Category: Article
ISSN: 1369-8001
DOI: 10.1016/s1369-8001(00)00034-2

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