✦ LIBER ✦
7632. Reduction of induced damage in GaAs processed by Ga+ focused-ion-beam-assisted Cl2 etching: Y Sugimoto et al, J Appl Phys, 68, 1990, 2392–2399
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 145 KB
- Volume
- 42
- Category
- Article
- ISSN
- 0042-207X
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