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Deep dry etching of GaAs and GaSb using Cl[sub 2]/Ar plasma discharges

✍ Scribed by Giehl, Alexander R.; Gumbel, Michael; Kessler, Matthias; Herhammer, Norbert; Hoffmann, Goetz; Fouckhardt, Henning

Book ID: 121308012
Publisher: AVS (American Vacuum Society)
Year: 2003
Tongue: English
Weight: 445 KB
Volume: 21
Category: Article
ISSN: 0734-211X
DOI: 10.1116/1.1623507

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