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Optical design for EUV lithography source collector

✍ Scribed by Shuqing Zhang, 张树青; Qi Wang, 王骐; Dongyuan Zhu, 祝东远; Runshun Li, 李润顺; Chang Liu, 刘畅

Book ID
115369073
Publisher
Optics InfoBase
Year
2011
Tongue
English
Weight
420 KB
Volume
9
Category
Article
ISSN
1671-7694

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A gas discharged based radiation source
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✍ R. Lebert; K. Bergmann; G. Schriever; W. Neff 📂 Article 📅 1999 🏛 Elsevier Science 🌐 English ⚖ 549 KB

A new high repetitive, compact and low cost gas discharge based EUV ,,lamp" has been studied as an alternative to laser-produced plasmas as EUV sources. First results using oxygen in a fast discharge of electrically stored energy around 1 J lead to a conversion efficiency of about 0.1% for the emiss