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Xenon Discharge-Produced Plasma Radiation Source for EUV Lithography

โœ Scribed by Zhang, C.H.; Lv, P.; Zhao, Y.P.; Wang, Q.; Katsuki, S.; Namihira, T.; Horta, H.; Imamura, H.; Kondo, Y.; Akiyama, H.

Book ID
117917978
Publisher
IEEE
Year
2010
Tongue
English
Weight
773 KB
Volume
46
Category
Article
ISSN
0093-9994

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A new high repetitive, compact and low cost gas discharge based EUV ,,lamp" has been studied as an alternative to laser-produced plasmas as EUV sources. First results using oxygen in a fast discharge of electrically stored energy around 1 J lead to a conversion efficiency of about 0.1% for the emiss