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Intense EUV incoherent plasma sources for EUV lithography and other applications

โœ Scribed by Silfvast, W.T.

Book ID
111895395
Publisher
IEEE
Year
1999
Tongue
English
Weight
225 KB
Volume
35
Category
Article
ISSN
0018-9197

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We describe a new high-brightness laser-plasma source for X-rays and extreme ultraviolet (EUV) radiation. By utilizing a liquid target the harmful emission of debris is significantly reduced or completely eliminated. The spectrum can be spectrally tailored by choosing a suitable liquid. We also show