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Ni fully silicided gates for 45 nm CMOS applications

✍ Scribed by Jorge A. Kittl; Anne Lauwers; Malgorzata A. Pawlak; Mark J.H. van Dal; Anabela Veloso; K.G. Anil; Geoffrey Pourtois; Caroline Demeurisse; Tom Schram; Bert Brijs; Muriel de Potter; Christa Vrancken; Karen Maex

Book ID: 104050407
Publisher: Elsevier Science
Year: 2005
Tongue: English
Weight: 640 KB
Volume: 82
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2005.07.084

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