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Design optimization of gate-silicided ESD NMOSFETs in a 45 nm bulk CMOS technology

✍ Scribed by David Alvarez; Kiran Chatty; Christian Russ; Michel J. Abou-Khalil; Junjun Li; Robert Gauthier; Kai Esmark; Ralph Halbach; Christopher Seguin


Book ID
108210826
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
997 KB
Volume
49
Category
Article
ISSN
0026-2714

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