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Investigation of Ni fully silicided gates for sub-45 nm CMOS technologies

✍ Scribed by M.A. Pawlak; J.A. Kittl; O. Chamirian; A. Veloso; A. Lauwers; T. Schram; K. Maex; A. Vantomme

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Ni fully silicided gates for 45 nm

✍ Jorge A. Kittl; Anne Lauwers; Malgorzata A. Pawlak; Mark J.H. van Dal; Anabela V 📂 Article 📅 2005 🏛 Elsevier Science 🌐 English ⚖ 640 KB

Design optimization of gate-silicided ES

✍ David Alvarez; Kiran Chatty; Christian Russ; Michel J. Abou-Khalil; Junjun Li; R 📂 Article 📅 2009 🏛 Elsevier Science 🌐 English ⚖ 997 KB

Investigation of Ni/Co bilayer salicidat

✍ Eun Ji Jung; Sug-Woo Jung; Hyun-Su Kim; Jong-Ho Yun; Seong Hwee Cheong; Byung He 📂 Article 📅 2005 🏛 Elsevier Science 🌐 English ⚖ 287 KB

Investigation of iridium as a gate elect

✍ M.A Pawlak; T Schram; K Maex; A Vantomme 📂 Article 📅 2003 🏛 Elsevier Science 🌐 English ⚖ 246 KB

Examination and evaluation of La2O3 as g

✍ V. Capodieci; F. Wiest; T. Sulima; J. Schulze; I. Eisele 📂 Article 📅 2005 🏛 Elsevier Science 🌐 English ⚖ 193 KB