✦ LIBER ✦

Negative-tone high-resolution photocatalytic resist for x-ray lithography

✍ Scribed by R. Dammel; K.-F. Dössel; J. Lingnau; J. Theis; H. Huber; H. Oertel; J. Trube

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Negative-tone chemically-amplified resis

✍ S. Landis; S. Pauliac; R. Hanawa; M. Suetsugu; M. Akita 📂 Article 📅 2004 🏛 Elsevier Science 🌐 English ⚖ 289 KB

Negative tone chemically amplified resis

✍ J. Saint-Pol; S. Landis; C. Gourgon; S. Tedesco; R. Hanawa; M. Suetsugu; M. Akit 📂 Article 📅 2003 🏛 Elsevier Science 🌐 English ⚖ 553 KB

Polystyrene negative resist for high-res

✍ Siqi Ma; Celal Con; Mustafa Yavuz; Bo Cui 📂 Article 📅 2011 🏛 Springer-Verlag 🌐 English ⚖ 455 KB

Photocatalytic novolak-based positive re

✍ R. Dammel; K.F. Dössel; J. Lingnau; J. Theis; H.L. Huber; H. Oertel 📂 Article 📅 1987 🏛 Elsevier Science 🌐 English ⚖ 311 KB

Identification of sensitive positive and

✍ A.E. Novembre; J.M. Kometani; C.S. Knurek; U. Kumar; T.X. Neenan; D.A. Mixon; O. 📂 Article 📅 1995 🏛 Elsevier Science 🌐 English ⚖ 530 KB

A high resolution negative working resis

✍ Yoshio Yamashita; Hideyuki Jinbo; Ryuji Kawazu; Takateru Asano; Hiroshi Umehara 📂 Article 📅 1991 🏛 Society for Plastic Engineers 🌐 English ⚖ 494 KB