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Polystyrene negative resist for high-resolution electron beam lithography

✍ Scribed by Siqi Ma; Celal Con; Mustafa Yavuz; Bo Cui

Book ID: 115021147
Publisher: Springer-Verlag
Year: 2011
Tongue: English
Weight: 455 KB
Volume: 6
Category: Article
ISSN: 1931-7573
DOI: 10.1186/1556-276x-6-446

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