High voltage electron beam lithography of the resolution limits of SAL 601 negative resist

✍ Scribed by A. Claβen; S. Kuhn; J. Straka; A. Forchel

• Publisher: Elsevier Science
• Year: 1992
• Tongue: English
• Weight: 299 KB
• Volume: 17
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(92)90007-e