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Micro-Nanostructured Interfaces Fabricated by the Use of Inorganic Block Copolymer Micellar Monolayers as Negative Resist for Electron-Beam Lithography

✍ Scribed by R. Glass; M. Arnold; J. Blümmel; A. Küller; M. Möller; J.P. Spatz


Publisher
John Wiley and Sons
Year
2003
Tongue
English
Weight
446 KB
Volume
13
Category
Article
ISSN
1616-301X

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