Identification of sensitive positive and negative working resist materials for proximity X-ray lithography

✍ Scribed by A.E. Novembre; J.M. Kometani; C.S. Knurek; U. Kumar; T.X. Neenan; D.A. Mixon; O. Nalamasu; N. Mu¨nzel

• Publisher: Elsevier Science
• Year: 1995
• Tongue: English
• Weight: 530 KB
• Volume: 27
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(94)00130-m