Application of positive and negative tone x-ray resist for 0.5μm CMOS device fabrication

✍ Scribed by U. Mescheder; U. Mackens; H. Lifka; R. Dammel; G. Pawloski; J. Theis

• Publisher: Elsevier Science
• Year: 1990
• Tongue: English
• Weight: 477 KB
• Volume: 11
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(90)90155-m