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Negative tone chemically amplified resist formulation optimizations for ultra high-resolution lithography

✍ Scribed by J. Saint-Pol; S. Landis; C. Gourgon; S. Tedesco; R. Hanawa; M. Suetsugu; M. Akita; S. Yamamoto


Book ID
114155616
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
553 KB
Volume
67-68
Category
Article
ISSN
0167-9317

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