Photocatalytic novolak-based positive resist for X-ray lithography - kinetics and simulation -

✍ Scribed by R. Dammel; K.F. Dössel; J. Lingnau; J. Theis; H.L. Huber; H. Oertel

• Publisher: Elsevier Science
• Year: 1987
• Tongue: English
• Weight: 311 KB
• Volume: 6
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(87)90080-3