A high resolution negative working resist, LMR-UV, for g- and i-line lithography

✍ Scribed by Yoshio Yamashita; Hideyuki Jinbo; Ryuji Kawazu; Takateru Asano; Hiroshi Umehara

• Publisher: Society for Plastic Engineers
• Year: 1991
• Tongue: English
• Weight: 494 KB
• Volume: 31
• Category: Article
• ISSN: 0032-3888
• DOI: 10.1002/pen.760311203