✦ LIBER ✦

Modeling of Silicon Dioxide Chemical Vapor Deposition from Tetraethoxysilane and Ozone

✍ Scribed by Romet, S.; Couturier, M. F.; Whidden, T. K.

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Analytical model for chemical vapor depo

✍ Eui Jung Kim; William N. Gill 📂 Article 📅 1994 🏛 Elsevier Science 🌐 English ⚖ 919 KB

Plasma-enhanced chemical vapour depositi

✍ W. Kulisch; T. Lippmann; R. Kassing 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 201 KB

Deposition of ultrathin silicon dioxide

✍ Ong, T. P.; Tobin, Philip; Mele, Thomas 📂 Article 📅 1995 🏛 American Institute of Physics 🌐 English ⚖ 576 KB

Improved hydrogen free chemical vapor de

✍ Yasutaka Uchida; Kohshi Taguchi; Masakiyo Matsumura 📂 Article 📅 1999 🏛 Elsevier Science 🌐 English ⚖ 246 KB

A new model for low pressure chemical va

✍ Eui Jung Kim; William N. Gill 📂 Article 📅 1994 🏛 Elsevier Science 🌐 English ⚖ 507 KB

Apparatus for chemical vapor deposition

📂 Article 📅 1977 🏛 Elsevier Science 🌐 English ⚖ 162 KB