✦ LIBER ✦

Analytical model for chemical vapor deposition of SiO2 films using tetraethoxysilane and ozone

✍ Scribed by Eui Jung Kim; William N. Gill

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

A new model for low pressure chemical va

✍ Eui Jung Kim; William N. Gill 📂 Article 📅 1994 🏛 Elsevier Science 🌐 English ⚖ 507 KB

Impurities in SiO2 films deposited by pl

✍ Naohira Maeda; Kunio Okimura; Akira Shibata; Kouzou Tsuchida; Eiji Saji 📂 Article 📅 1997 🏛 John Wiley and Sons 🌐 English ⚖ 672 KB

A chemical reaction model for physical v

✍ S. C. Jackson; B. N. Baron; R. E. Rocheleau; T. W. F. Russell 📂 Article 📅 1987 🏛 American Institute of Chemical Engineers 🌐 English ⚖ 997 KB

Vapor Pressures of Precursors for the Ch

✍ G.R. Alcott; R.M.C.M. van de Sanden; S. Kondic; J.L. Linden 📂 Article 📅 2004 🏛 John Wiley and Sons 🌐 English ⚖ 372 KB 👁 1 views

Metallorganic Chemical Vapor Deposition

✍ Sang Yeol Kang; Ha Jin Lim; Cheol Seong Hwang; Hyeong Joon Kim 📂 Article 📅 2010 🏛 John Wiley and Sons ⚖ 33 KB

Deposition of Bismuth Chalcogenide Thin

✍ John Waters; David Crouch; James Raftery; Paul O'Brien 📂 Article 📅 2004 🏛 John Wiley and Sons ⚖ 11 KB 👁 2 views