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Vapor Pressures of Precursors for the Chemical Vapor Deposition of Silicon-Based Films

✍ Scribed by G.R. Alcott; R.M.C.M. van de Sanden; S. Kondic; J.L. Linden

Publisher: John Wiley and Sons
Year: 2004
Tongue: English
Weight: 372 KB
Volume: 10
Category: Article
ISSN: 0948-1907
DOI: 10.1002/cvde.200306145

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