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Preferred Orientation of Chemical Vapor Deposited Polycrystalline Silicon Carbide Films

✍ Scribed by Y. Kajikawa; S. Noda; H. Komiyama

Publisher: John Wiley and Sons
Year: 2002
Tongue: English
Weight: 260 KB
Volume: 8
Category: Article
ISSN: 0948-1907
DOI: 10.1002/1521-3862(20020503)8:3<99::aid-cvde99>3.0.co;2-c

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