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Chemical vapor deposition of silicon carbide powders using pulsed CO2 Lasers

✍ Scribed by Dr. Malte Scholz; Dr. Werner Fuß; Prof. Dr. Karl-Ludwig Kompa


Publisher
John Wiley and Sons
Year
1993
Tongue
English
Weight
370 KB
Volume
5
Category
Article
ISSN
0935-9648

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## Abstract The process of plasma chemical deposition of silicon was investigated from its tetrafluoride containing 99.99% of ^28^Si isotope in the form of thin layer of nano‐crystalline silicon on silicon substrate and of thick layer of polycrystalline silicon on the inner surface of quartz reacto