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ChemInform Abstract: Chemical Vapor Deposition of HfO2 Thin Films Using a Novel Carbon-Free Precursor. Characterization of the Interface with the Silicon Substrate.

✍ Scribed by Jaehoo Park; Byoung Keon Park; Moonju Cho; Cheol Seong Hwang; Kiyoung Oh; Doo Young Yang

Publisher: John Wiley and Sons
Year: 2010
Weight: 35 KB
Volume: 33
Category: Article
ISSN: 0931-7597
DOI: 10.1002/chin.200213018

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