ChemInform Abstract: Chemical Vapor Deposition of Ru Thin Films with an Enhanced Morphology, Thermal Stability, and Electrical Properties Using a RuO4 Precursor.

✍ Scribed by Jeong Hwan Han; Sang Woon Lee; Gyu-Jin Choi; Sang Young Lee; Cheol Seong Hwang; Christian Dussarrat; Julien Gatineau

• Publisher: John Wiley and Sons
• Year: 2009
• Weight: 18 KB
• Volume: 40
• Category: Article
• ISSN: 0931-7597
• DOI: 10.1002/chin.200917216