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Chemical Vapor Deposition of TixSi1–xO2 Films: Precursor Chemistry Impacts Films Composition

✍ Scribed by R.C. Smith; N. Hoilien; C. Dykstra; S.A. Campbell; J.T. Roberts; W.L. Gladfelter

Publisher: John Wiley and Sons
Year: 2003
Tongue: English
Weight: 443 KB
Volume: 9
Category: Article
ISSN: 0948-1907
DOI: 10.1002/cvde.200390006

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