Chemical Vapor Deposition of β-LiGaO2 Films on Si(100) Using a Novel Single Precursor.
✍ Scribed by Myung M. Sung; Chang G. Kim; Yunsoo Kim
- Publisher
- John Wiley and Sons
- Year
- 2004
- Weight
- 90 KB
- Volume
- 35
- Category
- Article
- ISSN
- 0931-7597
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The four-membered-ring heterocyclic molecule Cp 2 TiCH 2 Si(Me 2 )NSiMe 3 (1; Cp = Ϫ C 5 H 5 ) was studied as a single-source precursor to titanium-based ceramic thin films. Its decomposition was studied at atmospheric and low pressure under nitrogen, argon and helium by TG-DTA-MS. Thin films contai
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