Static Vapor Pressure Measurement of Low Volatility Precursors for Molecular Vapor Deposition Below Ambient Temperature
✍ Scribed by T. Ohta; F. Cicoira; P. Doppelt; L. Beitone; P. Hoffmann
- Publisher
- John Wiley and Sons
- Year
- 2001
- Tongue
- English
- Weight
- 347 KB
- Volume
- 7
- Category
- Article
- ISSN
- 0948-1907
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✦ Synopsis
Static vapor pressure measurements of volatile metal precursors, in the pressure range 10 ±1 Pa to 10 3 Pa, are described. The vapor pressures and the sublimation or evaporation enthalpies, in the range 265 K±300 K, of Mo(CO) 6 (77.7 kJ mol ±1 ), two dimethyl(b-diketonato)gold(III) complexes, Me 2 Au(tfa) (83.5 kJ mol ±1 ) and Me 2 Au(hfa) (68.1 kJ mol ±1 ), and an inorganic Rh precursor, [(PF 3 ) 2 RhCl] 2 (90.8 kJ mol ±1 ), were determined. The sublimation enthalpy for Mo(CO) 6 was larger by more than 10 % in the measured temperature range than reported values measured at higher temperatures. At ambient temperatures, partial decomposition was observed only for the gold precursors.