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A new model for low pressure chemical vapor deposition of SiO2 films by ozone augmented tetraethoxysilane

✍ Scribed by Eui Jung Kim; William N. Gill

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Analytical model for chemical vapor depo

✍ Eui Jung Kim; William N. Gill 📂 Article 📅 1994 🏛 Elsevier Science 🌐 English ⚖ 919 KB

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