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Apparatus for chemical vapor deposition of silicon dioxide from silanc gas. (USA)

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Modeling of Silicon Dioxide Chemical Vap

✍ Romet, S.; Couturier, M. F.; Whidden, T. K. 📂 Article 📅 2001 🏛 The Electrochemical Society 🌐 English ⚖ 223 KB

Substrate-dependent growth of atmospheri

✍ Jonathan D. Chapple-Sokol; Roy G. Gordon 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 746 KB

Recrystallization of amorphous silicon f

✍ Nakazawa, Kenji 📂 Article 📅 1991 🏛 American Institute of Physics 🌐 English ⚖ 663 KB

Production of nanocrystalline silicon la

✍ P. G. Sennikov; S. V. Golubev; V. I. Shashkin; D. A. Pryakhin; M. N. Drozdov; B. 📂 Article 📅 2009 🏛 SP MAIK Nauka/Interperiodica 🌐 English ⚖ 187 KB

Room temperature process for chemical va

✍ Hitoshi Habuka; Yusuke Ando; Masaki Tsuji 📂 Article 📅 2011 🏛 Elsevier Science 🌐 English ⚖ 709 KB

Reactor and Reaction Model for the Hot-W

✍ Pant, Atul; Huff, Marylin C.; Russell, T. W. F. 📂 Article 📅 2001 🏛 American Chemical Society 🌐 English ⚖ 193 KB