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Production of nanocrystalline silicon layers using the plasma enhanced chemical vapor deposition from the gas phase of silicon tetrafluoride

✍ Scribed by P. G. Sennikov; S. V. Golubev; V. I. Shashkin; D. A. Pryakhin; M. N. Drozdov; B. A. Andreev; Yu. N. Drozdov; A. S. Kuznetsov; H. -J. Pohl

Book ID
110169027
Publisher
SP MAIK Nauka/Interperiodica
Year
2009
Tongue
English
Weight
187 KB
Volume
89
Category
Article
ISSN
0021-3640

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