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Synthesis of novel p-type nanocrystalline silicon from SiH2Cl2 and SiCl4 by rf plasma-enhanced chemical vapor deposition

✍ Scribed by Yali Li; Yoshie Ikeda; Yasutake Toyoshima; Hajime Shirai

Book ID: 108289028
Publisher: Elsevier Science
Year: 2006
Tongue: English
Weight: 270 KB
Volume: 506-507
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2005.08.023

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