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Plasma enhanced chemical vapor deposition of nitrogen-incorporated silicon oxide films using TMOS/N2O gas

✍ Scribed by M.S. Kang; T.H. Chung; Y. Kim

Book ID
108289025
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
187 KB
Volume
506-507
Category
Article
ISSN
0040-6090

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