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Materials and device properties of pseudomorphic InxGa1−xAs/Al0.3Ga0.7As/GaAs high electron mobility transistors (0

✍ Scribed by T. Schweizer; K. Köhler; P. Ganser; A. Hülsmann; P. Tasker


Book ID
104721979
Publisher
Springer
Year
1991
Tongue
English
Weight
445 KB
Volume
53
Category
Article
ISSN
1432-0630

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## As heierostmctures grown on GaAs sub- strates with a step-graded metamolphic In,Ga, -As buffer were characterized. Cross-sectional TEM micrographs revealed that an unstrained and dislocation-free In,,,Ga,,,As layer used as a buffer can be obtained. A 0.6-pin-long gate HEMTbased on this heterost