In 0.48 Ga 0.52 P/In 0.20 Ga 0.80 As/GaAs pseudomorphic high electron mobility transistor (p-HEMT) structures were grown by solid-source molecular beam epitaxy (SSMBE) using a valved phosphorus cracker cell. The electron mobility and sheet carrier density at room temperature were 1700 cm 2 /Vs and 3
โฆ LIBER โฆ
Study of In0.48Ga0.52P/In0.2Ga0.8As/GaAs pseudomorphic high electron mobility transistor using a two-dimensional device simulator
โ Scribed by S.F Yoon; A.H.T Kam; B.P Gay; H.Q Zheng; G.I Ng
- Book ID
- 108361685
- Publisher
- Elsevier Science
- Year
- 1999
- Tongue
- English
- Weight
- 477 KB
- Volume
- 30
- Category
- Article
- ISSN
- 0026-2692
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