CdS thin films were prepared using rf planar magnetron sputtering in Ar atmosphere. Different deposition temperatures between 150 and 250 C and different rf powers between 30 and 130 W were used. The films had hexagonal structure with crystallites oriented in the h100i direction. The increase of dep
β¦ LIBER β¦
Macrocrystalline silicon thin films prepared by RF reactive magnetron sputter deposition
β Scribed by MF Cerqueira; M Andritschky; L Rebouta; JA Ferreira; MF da Silva
- Publisher
- Elsevier Science
- Year
- 1995
- Tongue
- English
- Weight
- 748 KB
- Volume
- 46
- Category
- Article
- ISSN
- 0042-207X
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