CdS Thin Films Prepared by RF Magnetron Sputtering in Ar Atmosphere

✍ Scribed by Punnoose, A. ;Marafi, M. ;Prabu, G. ;El-Akkad, F.

• Publisher: John Wiley and Sons
• Year: 2000
• Tongue: English
• Weight: 162 KB
• Volume: 177
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/(sici)1521-396x(200002)177:2<453::aid-pssa453>3.0.co;2-r

✦ Synopsis

CdS thin films were prepared using rf planar magnetron sputtering in Ar atmosphere. Different deposition temperatures between 150 and 250 C and different rf powers between 30 and 130 W were used. The films had hexagonal structure with crystallites oriented in the h100i direction. The increase of deposition temperature caused an increase in the crystallite size (from 380 to 450 # e) and a decrease in the resistivity (from 3.87 to 0.95 W cm). The increase in the rf power (from 30 to 130 W) caused a decrease in the grain size (from 480 to 320 # e) and an increase in the resistivity (from 0.51 to 2.05 W cm) above 70 W. The average optical transmission in the visible region of the spectrum ranged between 71 and 86%. The quality of the films as window layers for solar cell applications was investigated.