𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Nanostructured GaAs(N) Thin Films Prepared by RF Sputtering

✍ Scribed by O. Alvarez-Fregoso; J.A. Juárez-Islas; O. Zelaya-Angel; J.G. Mendoza-Alvarez

Publisher
John Wiley and Sons
Year
2000
Tongue
English
Weight
130 KB
Volume
220
Category
Article
ISSN
0370-1972

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

CdS Thin Films Prepared by RF Magnetron
CdS Thin Films Prepared by RF Magnetron Sputtering in Ar Atmosphere
✍ Punnoose, A. ;Marafi, M. ;Prabu, G. ;El-Akkad, F. 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 162 KB 👁 2 views

CdS thin films were prepared using rf planar magnetron sputtering in Ar atmosphere. Different deposition temperatures between 150 and 250 C and different rf powers between 30 and 130 W were used. The films had hexagonal structure with crystallites oriented in the h100i direction. The increase of dep

Preparation of piezoelectric ZnO thin fi
Preparation of piezoelectric ZnO thin films by target-facing-type sputtering method
✍ Ken-ya Hashimoto; Syotaro Ogawa; Akinori Nonoguchi; Tatsuya Omori; Masatsune Yam 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 231 KB

This paper describes the deposition of high-quality zinc oxide (ZnO) thin film by reactive dc target-facing-type sputtering (DC-TFTS) using an arc killer that periodically applies a positive pulse to the negative dc discharge current. High-speed deposition of high-quality thin film, which is a merit

XPS and x-ray diffraction characterizati
XPS and x-ray diffraction characterization of thin Co-Al-N alloy films prepared by reactive sputtering deposition
✍ Asami, K.; Ohnuma, S.; Masumoto, T. 📂 Article 📅 1998 🏛 John Wiley and Sons 🌐 English ⚖ 368 KB 👁 2 views

## Thin (x = 0-30 at.% ) alloy Ðlms prepared by a reactive radio frequency (r.f.) sputtering (Co 0.8 Al 0.2 ) 100-x N x method were characterized by XPS and x-ray di †raction (XRD). The Ðlm with no nitrogen consisted of a CsCltype CoAl metallic compound, while the nitrogen-containing alloys were c

Relationship between Condition of Deposi
Relationship between Condition of Deposition and Properties of W-Ti-N Thin Films Prepared by Reactive Magnetron Sputtering
✍ A. V. Kuchuk; V. P. Kladko; O. S. Lytvyn; A. Piotrowska; R. A. Minikayev; R. Rat 📂 Article 📅 2006 🏛 John Wiley and Sons 🌐 English ⚖ 313 KB 👁 2 views

A correlation between the film properties of nitrides, oxides etc., and their structure, is of fundamental importance – not only for thin solid films physics but also for practical applications. The structure of the films depends on deposition methods and their parameters. The relationship between p