This paper describes the deposition of high-quality zinc oxide (ZnO) thin film by reactive dc target-facing-type sputtering (DC-TFTS) using an arc killer that periodically applies a positive pulse to the negative dc discharge current. High-speed deposition of high-quality thin film, which is a merit
Thermal Stability of ??-Fe16N2 Thin Films Prepared by Facing-Target Sputtering
β Scribed by Xu, Yinghua ;Jiang, Enyong ;Wang, Yi ;Hou, Denglu ;Ren, Shiwei ;Bai, Haili
- Publisher
- John Wiley and Sons
- Year
- 2001
- Tongue
- English
- Weight
- 160 KB
- Volume
- 184
- Category
- Article
- ISSN
- 0031-8965
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
A correlation between the film properties of nitrides, oxides etc., and their structure, is of fundamental importance β not only for thin solid films physics but also for practical applications. The structure of the films depends on deposition methods and their parameters. The relationship between p
## Thin (x = 0-30 at.% ) alloy Γlms prepared by a reactive radio frequency (r.f.) sputtering (Co 0.8 Al 0.2 ) 100-x N x method were characterized by XPS and x-ray di β raction (XRD). The Γlm with no nitrogen consisted of a CsCltype CoAl metallic compound, while the nitrogen-containing alloys were c