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Relationship between Condition of Deposition and Properties of W-Ti-N Thin Films Prepared by Reactive Magnetron Sputtering

✍ Scribed by A. V. Kuchuk; V. P. Kladko; O. S. Lytvyn; A. Piotrowska; R. A. Minikayev; R. Ratajczak

Publisher
John Wiley and Sons
Year
2006
Tongue
English
Weight
313 KB
Volume
8
Category
Article
ISSN
1438-1656

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✦ Synopsis

A correlation between the film properties of nitrides, oxides etc., and their structure, is of fundamental importance – not only for thin solid films physics but also for practical applications. The structure of the films depends on deposition methods and their parameters. The relationship between properties (chemical and phase compositions, surface morphology, and electrical resistivity) and nitrogen partial pressure of reactive magnetron sputtered W‐Ti‐N thin films has been discussed here in detail.

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