CdS thin films were prepared using rf planar magnetron sputtering in Ar atmosphere. Different deposition temperatures between 150 and 250 C and different rf powers between 30 and 130 W were used. The films had hexagonal structure with crystallites oriented in the h100i direction. The increase of dep
β¦ LIBER β¦
Microstructure and Photoluminescence of CdS-Doped Silica Films Grown by RF Magnetron Sputtering
β Scribed by A.G. Rolo; M.V. Stepikhova; S.A. Filonovich; C. Ricolleau; M.I. Vasilevskiy; M.J.M. Gomes
- Publisher
- John Wiley and Sons
- Year
- 2002
- Tongue
- English
- Weight
- 236 KB
- Volume
- 232
- Category
- Article
- ISSN
- 0370-1972
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