CdS thin films were prepared using rf planar magnetron sputtering in Ar atmosphere. Different deposition temperatures between 150 and 250 C and different rf powers between 30 and 130 W were used. The films had hexagonal structure with crystallites oriented in the h100i direction. The increase of dep
Trap Levels in RF Sputtered CdS Thin Films
β Scribed by Ashour, H. ;El Akkad, F.
- Publisher
- John Wiley and Sons
- Year
- 2001
- Tongue
- English
- Weight
- 70 KB
- Volume
- 184
- Category
- Article
- ISSN
- 0031-8965
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β¦ Synopsis
The trap levels in CdS thin films prepared by rf magnetron sputtering have been investigated using Photoinduced Current Transient Spectroscopy (PICTS). Trap levels in the range 0.08-1.06 eV have been detected. Those levels are tentatively attributed to native defects and foreign impurities (particularly Cu and Ag).
π SIMILAR VOLUMES
The technologies of fabrication of thin film phosphors based on gallium nitride using rf-magnetron sputtering are developed and properties of films are studied. Spectral parameters of rf-discharge plasma emission of nitrogen used as a working gas are investigated. The dependence of GaN thin film dep